PHOTORESIST COMPOSITION

摘要

Polymers having an average molecular weight Mw (weight average) of 5,000 to 1,000,000 (measured by gel permeation chromatography), comprising structural repeating units of the formulae I-IV: in which R1, R2, R3 and R4 independently of one another are hydrogen, methyl or halogen, R5 and R6 independently of one another are C1-C6alkyl, R7, R8, R9 and R10 independently of one another are hydrogen, C1-C4alkyl, C1-C4alkoxy or halogen, and w, x, y and z are numbers equal to or greater than 1, with the provision that the quotient $which\; is\; obtainable\; from\; the\; sum\; of\; the\; structural\; units\; having\; protecting\; groups\; divided\; by\; the\; sum\; of\; all\; of\; the\; structural\; units\; present,\; obeys\; the\; condition\; 0.10$