PRODUCTION OF A SILICEOUS REFRACTORY MASS

摘要

A process is provided producing a crystalline siliceous refractory mass by projecting solid refractory particles, solid silicon particles and gaseous oxygen against a surface in such a way that reaction between the silicon particles and gaseous oxygen occurs against the surface, thereby releasing the heat of reaction against the surface so that a coherent refractory mass comprising cristobalite is formed, wherein the solid refractory particles comprise silica in the form of vitreous silica and in that the surface against which they are projected is at a temperature of a least 1000 DEG C. The process can be used for in situ repair of high temperature furnaces such as glassmaking furnaces or for the manufacture of high quality refractory bricks.