发明名称 Wafer holder for semiconductor wafer polishing machine
摘要 <p>A semi-conductor wafer polishing machine (10) having at least one polishing pad assembly (12) and at least one wafer holder (18) positioned to hld a semi-conductor wafer against the polishing pad assembly (12) includes a joint (20) having two axes of rotation intersecting at a centre of rotation. A wafer chuck (32) is supported on the joint (20) adjacent the periphery of the chuck (32) to provide higher material removal rates at the centre of the wafer than the periphery of the wafer during polishing. <IMAGE></p>
申请公布号 EP0706854(A1) 申请公布日期 1996.04.17
申请号 EP19950307173 申请日期 1995.10.11
申请人 ONTRAK SYSTEMS, INC. 发明人 BOLANDI, HOOMAN;WELDON, DAVID EDWIN
分类号 B24B37/30;H01L21/304;(IPC1-7):B24B37/04 主分类号 B24B37/30
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