发明名称 |
Wafer holder for semiconductor wafer polishing machine |
摘要 |
<p>A semi-conductor wafer polishing machine (10) having at least one polishing pad assembly (12) and at least one wafer holder (18) positioned to hld a semi-conductor wafer against the polishing pad assembly (12) includes a joint (20) having two axes of rotation intersecting at a centre of rotation. A wafer chuck (32) is supported on the joint (20) adjacent the periphery of the chuck (32) to provide higher material removal rates at the centre of the wafer than the periphery of the wafer during polishing. <IMAGE></p> |
申请公布号 |
EP0706854(A1) |
申请公布日期 |
1996.04.17 |
申请号 |
EP19950307173 |
申请日期 |
1995.10.11 |
申请人 |
ONTRAK SYSTEMS, INC. |
发明人 |
BOLANDI, HOOMAN;WELDON, DAVID EDWIN |
分类号 |
B24B37/30;H01L21/304;(IPC1-7):B24B37/04 |
主分类号 |
B24B37/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|