发明名称 Photo mask
摘要 A phase-shifted photo mask capable of discrimination between phase shifting portions and a transparent portion (a bare surface portion of a substrate) by microscope observation with visible light. An SOG (spin-on-glass) layer mixed with inorganic colored ions (Co2+, Mn3+, Ni2+ or the like) having an absorption characteristic to the visible light is formed on the surface of the substrate which is substantially transparent to an exposure light (ultraviolet light) and the undesired portions of the SOG layer excluding the portions which are to form the phase shifting portions are removed.
申请公布号 US5508132(A) 申请公布日期 1996.04.16
申请号 US19940272861 申请日期 1994.07.08
申请人 NIKON CORPORATION 发明人 KOMATSU, MASAYA
分类号 G03F1/08;G03F1/00;H01L21/027;(IPC1-7):G03F9/00 主分类号 G03F1/08
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