发明名称 |
Dichromatic photomask and a method for its fabrication |
摘要 |
A method of manufacturing a photomask for the production of dual depth features on substrates, and the photomask so manufactured, wherein the method of manufacturing the photomask is comprised of the steps of: (1) coating a substrate which transmits at least two selected wavelengths with: a) an optical filter material which prevents the transmission of at least one of the wavelengths, b) an opaque masking material, and c) a dual tone photoresist; (2) using a single mastering tool to selectively expose areas of the coated substrate to one of the wavelengths; (3) developing the photoresist; (4) etching the exposed masking material and optical filter material; (5) exposing the remaining coated substrate; (6) developing the remaining photoresist; (7) etching the exposed surface; and (8) stripping away the remaining photoresist.
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申请公布号 |
US5501926(A) |
申请公布日期 |
1996.03.26 |
申请号 |
US19950383553 |
申请日期 |
1995.01.31 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHENG, JOHN C.;REITH, TIMOTHY M.;WONG, JAMES S. |
分类号 |
G03F1/08;G03F1/14;G11B7/26;H01L21/302;H01L21/3065;(IPC1-7):G11B7/26;G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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