| 摘要 |
<p>PURPOSE: To provide a photoresist resin compsn. not undergoing the blocking of polymn. by oxygen and having satisfactory surface hardening property and such photoresist characteristics as high resolution and developability with a dil. aq. alkali soln. by using specified components. CONSTITUTION: This photoresist resin compsn. contains a photopolymerizable monomer having vinyloxyalkyl groups represented by formula I, a triazine compd. represented by formula II and a solvent as essential components. In the formula I, (n) is 0-20 as the average number of repetition, each of R1 -R6 is H, a halogen, alkyl, aryl, aralkyl, alkoxy, aryloxy or cycloalkyl and Q is a group such as -OH. In the formula II, each of R7 -R9 is an alkyl which may have a substituent, etc., and at least one of R7 -R9 is a mono-, di- or trihalogen substd. methyl.</p> |
