DEVICE AND METHOD FOR PLASMA TREATING,申请号JP19940205645-传众专利搜索

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发明名称	DEVICE AND METHOD FOR PLASMA TREATING
摘要
申请公布号	JPH0869896(A)	申请公布日期	1996.03.12
申请号	JP19940205645	申请日期	1994.08.30
申请人	SONY CORP	发明人	KADOMURA SHINGO
分类号	H05H1/46;C23F4/00;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H05H1/46;H01L21/306	主分类号	H05H1/46
代理机构		代理人
主权项
地址

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