PHOTORESIST COMPOSITION FOR FAR-ULTRAVIOLET-RAY EXPOSURE ANDUSING METHOD THEREOF

摘要

PURPOSE: To provide a radiation sensitive resist compsn. for far UV ray having improved sensitivity and resolution. CONSTITUTION: This radiation sensitive resist compsn. contains (a) 1 to 10wt.% radiation sensitive acid forming agent, (b) 10 to 40wt.% substd. androstane and (c) 50 to 90wt.% copolymer binder. This resist compsn. is exposed by UV ray of a wavelength of 193nm in particular and a resist film having 1 micron thickness is exposed to the extent that an image is sufficiently formable event at a radiation dose below about 15mJ/cm<2> .