Highly charged ion beam generator

摘要

The device generates beams of highly charged ions of high brilliance. It has an ion source including a plasma chamber (1) surrounded by magnets. The vacuum required to generate the plasma is generated in this chamber (1) which contains a magnetically enclosed plasma. This plasma is generated and heated with the help of energy fed in. Highly charged ions are generated in the plasma and can be extracted from it. An electric drawing field arrangement comprising a plasma electrode (10) and an extraction electrode (11) draws the ions from the plasma along an ion source axis (z). To magnetically lock in the plasma perpendicular to the ion source axis, the plasma chamber (1), in the region of the plasma, is surrounded by an even number (2,4,..) of permanent magnet collars (3.1,,3.4) whose polarities alternate along the ion source axis (z). Or it may be surrounded by an odd number of magnet coils (64.1,..64.9) with current passing through them in al ternate directions along the axis (z). To lock the plasma parallel to the axis, the ends (19,20) of the chamber (1) are surrounded by at least one permanent magnet collar or magnet coil. The magnet elements attached to the ends (19,20) of the plasma chamber (1) have opposite polarities or the same current flow direction such that the near the end walls (19,20), the magnetic field is stronger.