发明名称 |
Jet plasma process and apparatus |
摘要 |
A process and apparatus for the plasma deposition of a carbon-rich coating onto a substrate is provided. This method includes the steps of: providing a substrate in a vacuum chamber; and generating a carbon-rich plasma in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma in the hollow cathode slot system, and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma. The plasma is deposited on the substrate to form a carbon-rich coating.
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申请公布号 |
US5464667(A) |
申请公布日期 |
1995.11.07 |
申请号 |
US19940291111 |
申请日期 |
1994.08.16 |
申请人 |
MINNESOTA MINING AND MANUFACTURING COMPANY |
发明人 |
KOEHLER, GUENTER A.;KIRK, SETH M.;FOLLETT, GARY J. |
分类号 |
C23C4/04;C23C4/12;C23C16/26;C23C16/50;C23C16/513;H01J37/32;(IPC1-7):B05D3/06 |
主分类号 |
C23C4/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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