发明名称 Semimetal-semiconductor heterostructures and multilayers
摘要 The present invention provides for the fabrication of single layer semimetal/semiconductor heterostructures and multilayer semimetal/semiconductor structures. Each semimetal/semiconductor layer fabricated in accordance with the present invention has compatible crystal symmetry across the heterojunction between a semimetal and a semiconductor. A single layer semimetal/semiconductor structure is fabricated by growing a rhombohedral semimetal in a [111] direction on a substrate material having a (111) orientation, and then growing a zincblende semiconductor in a [111] direction on the semimetal. A multilayer semimetal/semiconductor structure may be grown from the single layer semimetal/semiconductor structure by growing an additional rhombohedral semimetal layer in a [111] direction on the preceding semiconductor grown, then growing an additional zincblende semiconductor layer in a [111] direction on the additional semimetal layer, and then repeating this process as many times as desired. Each semimetal to be sandwiched between semiconductors in the multilayer semimetal/semiconductor structure may be grown thin enough that the semimetal is converted into a semiconductor.
申请公布号 US5449561(A) 申请公布日期 1995.09.12
申请号 US19920916050 申请日期 1992.07.17
申请人 UNIVERSITY OF HOUSTON 发明人 GOLDING, TERRY D.;MILLER, JR., JOHN H.
分类号 C30B25/00;C30B23/02;C30B25/02;H01L21/20;H01L21/203;H01L21/285;H01L29/205;H01L29/68;(IPC1-7):B32B15/04 主分类号 C30B25/00
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