发明名称 PREPARATION OF FERROELECTRIC THIN FILM
摘要 PURPOSE: To provide a method for manufacturing a ferroelectric body thin film that can control the crystal structure of SrTiO3 or (Ba, Sr) TiO3 . CONSTITUTION: A silicon substrate 100 where Pt 102 is adhered is retained at approximately 300 degrees, then an amorphous film 104 of (Ba, Sr) TiO3 is adhered onto the substrate, and then the substrate is retained at a temperature of approximately 620 degrees for annealing in oxygen atmosphere.
申请公布号 JPH07176704(A) 申请公布日期 1995.07.14
申请号 JP19930275639 申请日期 1993.11.04
申请人 TEXAS INSTR INC <TI> 发明人 PIJIYUTSUSHIYU BATACHIYARIYA;YONEDA TADAHIRO;BOKU YOSHIHIRO;NISHIOKA TAIJO
分类号 H01L27/04;H01L21/822;H01L21/8242;H01L21/8246;H01L27/10;H01L27/105;H01L27/108 主分类号 H01L27/04
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