发明名称 Elektrostatische keramische Halteplatte mit thermischem Zyklus.
摘要 An electrostatic chuck 8 assembly includes, from top to bottom: a top isolation layer 42; an electrostatic pattern layer 44 comprised of an electrically conductive electrostatic pattern 46 disposed on a substrate 45; a heating layer 50 comprised of an electrically conductive heating pattern 54 disposed on a substrate; a support 60; and, a heat sink base 70 having backside cooling and insulating channels 78, 80 provided therein. <IMAGE>
申请公布号 DE69201264(T2) 申请公布日期 1995.07.06
申请号 DE1992601264T 申请日期 1992.04.07
申请人 INTERNATIONAL BUSINESS MACHINES CORP., ARMONK, N.Y., US 发明人 LOGAN, JOSEPH SKINNER, POUGHKEEPSIE, NEW YORK 12603, US;RUCKEL, RAYMOND ROBERT, GARRISON, NEW YORK 10524, US;TOMPKINS, ROBERT ELI, PLEASANT VALLEY, NEW YORK 12569, US;WESTERFIELD, ROBERT PETER, JR., MONTGOMERY, NEW YORK 12549, US
分类号 B23Q3/15;B23Q11/14;H01L21/683;H02N13/00;(IPC1-7):H01L21/00 主分类号 B23Q3/15
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