| 摘要 |
PURPOSE:To provide a chemical amplification type radiation sensitive resin composition excellent in sensitivity, resolution, and the like, specially excellent in coating property to a large-bored base by a spin-coating method. CONSTITUTION:Resist for forming a pattern by generating acid by the irradiation of radiation and changing the solubility of a radiation irradiated part to a developer by chemical change due to the catalytic action of the acid is dissolved in a solvent to form a radiation sensitive resin composition. The solvent in this case contains a monoketone compound (ketone group solvent) of 5-10 carbon. As the ketone group solvent, it is desirable to use methylamyl ketone, methylisoamyl ketone, methylhexyl ketone, or the like. The ketone group solvent can be suitably used in the same way singularly or in the mixed state of several kinds of ketone compounds different in structure regarding the sort of an alkyl group and the sort of an isomer. |
