发明名称 GROWING A NITROGEN DOPED EPITAXIAL II-VI COMPOUND LAYER ON A SINGLE CRYSTAL SUBSTRATE
摘要 The concentration of N acceptors in an as-grown epitaxial layer of a II-VI semiconductor compound is enhanced by the use of tertiary butyl amine as the dopant carrier, and is further enhanced by the use of photo-assisted growth using illumination whose wavelenght is at least above the bandgap energy of the compound at the growth temperature.
申请公布号 WO9502710(A1) 申请公布日期 1995.01.26
申请号 WO1994IB00193 申请日期 1994.07.04
申请人 PHILIPS ELECTRONICS N.V.;PHILIPS NORDEN AB 发明人 TASKAR, NIKHIL;KHAN, BABAR;DORMAN, DONALD
分类号 C30B29/48;C23C16/18;C30B25/02;C30B25/10;H01L21/205;H01L21/365 主分类号 C30B29/48
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