METHOD AND DEVICE OF CLEANING SUBSTRATE

摘要

PURPOSE:To provide a method and a device for cleaning a substrate high in cleanness. CONSTITUTION:In a cleaning method wherein fine particles adhering to a substrate 5 are removed by cleaning liquid, a first cleaning process wherein cleaning liquid L1 given ultrasonic vibrations is sprayed on a substrate and a second cleaning process wherein cleaning liquid L2 of higher pressure than the cleaning liquid L1 is sprayed on the ultrasonically cleaned wafer are provided.