发明名称 METHOD AND APPARATUS FOR ADJUSTING ELECTRON BEAM APPARATUS
摘要 In an electron beam apparatus having an energy analyzer for analyzing the electron beam energy, matching may be performed accurately and easily of the position to be irradiated by an electron beam and the position for which an energy analysis is performed. The electron beam apparatus includes: an electron-optical lens column 401 provided as capable of scanning an electron beam ED in an XY direction and capable of deflecting it in the XY direction; an energy analyzer 408; and image display means 416 for displaying an SEM image of a predetermined range on a sample 407 by an electron beam scanning. An energy analysis area 504 for which electrons are efficiently taken into the energy analyzer is displayed as an image upon the SEM image by analyzing an output information obtained at the energy analyzer 408 at the time of an electron beam scanning. An analyzing electron-beam irradiation position 502 to be irradiated by an electron beam on the trajectory emitted from the electron-optical lens column 401 at the time corresponding to the non-scanning state of the electron beam is displayed as an image upon the SEM image. The trajectory of the electron beam to be irradiated onto the sample is deflected so that the energy analysis area 504 and the analyzing electron-beam irradiation position 502 are matched on the SEM image.
申请公布号 CA2165440(A1) 申请公布日期 1995.01.05
申请号 CA19942165440 申请日期 1994.06.22
申请人 RESEARCH DEVELOPMENT CORPORATION OF JAPAN;TOSOH CORPORATION 发明人 TSUKAJIMA, JUNICHI;HAYASHI, TOSHINORI;ENOKIJIMA, TORU
分类号 G01N23/00;H01J37/256;(IPC1-7):H01J37/28 主分类号 G01N23/00
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