SURFACE TREATMENT OF SILICON WAFER,申请号JP19920349882-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	SURFACE TREATMENT OF SILICON WAFER
摘要
申请公布号	JPH06192861(A)	申请公布日期	1994.07.12
申请号	JP19920349882	申请日期	1992.12.01
申请人	PIYUARETSUKUSU:KK;TOSHIBA CORP	发明人	MURAOKA HISASHI
分类号	C23G1/02;G01N1/28;(IPC1-7):C23G1/02	主分类号	C23G1/02
代理机构		代理人
主权项
地址

您可能感兴趣的专利

FRONT VEHICLE BODY STRUCTURE OF AUTOMOBILE

PILLAR UPPER STRUCTURE

WIPER-DIRECTION INDICATOR CONTROL DEVICE

FOOTREST DEVICE

DOME SEAL DEVICE AND SHIP HAVING IT

DEVICE FOR CURLING STRIP MEMBER WITH REINFORCING MATERIAL, METHOD FOR MAKING SPIRAL PIPE, AND DEVICE FOR MAKING SPIRAL PIPE

VIBRATION CONTROL DEVICE FOR RAILWAY VEHICLE

THREE-GROUP ZOOM LENS SYSTEM AND IMAGE PICKUP APPARATUS USING THE SAME

OPTICAL COUPLING ADHESIVE AND OPTICAL COUPLING METHOD USING IT

PRINCIPAL FOCUS CORRECTION OPTICAL SYSTEM AND REFLECTING TELESCOPE USING THE SAME

BELT CONVEYER AND IMAGE FORMING APPARATUS

LENS BARREL COPING WITH ALIGNING ADHESION, AND LENS BARREL UNIT USING THE SAME AND DIGITAL CAMERA

IMAGE FORMING APPARATUS USING LIQUID DEVELOPER AND METHOD FOR REMOVING LIQUID DEVELOPER FOR IMAGE FORMING APPARATUS

COLOR WHEEL FOR PROJECTOR

PROJECTOR DEVICE AND CONTROL METHOD FOR PROJECTOR DEVICE

IMAGE PROJECTOR

LIQUID CRYSTAL MODULE

CARRIER FOR ELECTROPHOTOGRAPHIC DEVELOPMENT AND ELECTROPHOTOGRAPHIC DEVELOPER