发明名称 MANUFACTURE OF MULTILAYER INTERCONNECTION BOARD
摘要 PURPOSE:To reduce the nonuniformity of the thickness of a photosensitive organic high polymer film to be used as a layer insulating film for a multilayer interconnection board which uses organic high polymer material as a layer insulating film. CONSTITUTION:Photosensitive polyimide is applied on a basic polyimide film 2 on an alumina board 1 so as to form a layer insulating film 3 and a groove 4 for forming metal wiring is formed on the layer insulating film 3 along an area whereupon first layer wiring is to be provided. Copper plating wiring 5 is provided in the groove 4 by electroless plating and electrolytic plating and the surface of the copper plating wiring 5 and the surface of the layer insulating film 3 are formed almost flatly. When photosensitive polyimide is applied and top layer insulating films 6 and 8 are formed, the surfaces of the layer insulating films 6 and 8 can be formed flatly and the nonuniformity of the film thickness is reduced.
申请公布号 JPH06132663(A) 申请公布日期 1994.05.13
申请号 JP19920308250 申请日期 1992.10.21
申请人 MURATA MFG CO LTD 发明人 MIYAZAKI MAKOTO;YAMANO KAZUHIKO;IMAGAWA SHUNJIRO
分类号 H05K3/46;(IPC1-7):H05K3/46 主分类号 H05K3/46
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