发明名称 |
MANUFACTURE OF MULTILAYER INTERCONNECTION BOARD |
摘要 |
PURPOSE:To reduce the nonuniformity of the thickness of a photosensitive organic high polymer film to be used as a layer insulating film for a multilayer interconnection board which uses organic high polymer material as a layer insulating film. CONSTITUTION:Photosensitive polyimide is applied on a basic polyimide film 2 on an alumina board 1 so as to form a layer insulating film 3 and a groove 4 for forming metal wiring is formed on the layer insulating film 3 along an area whereupon first layer wiring is to be provided. Copper plating wiring 5 is provided in the groove 4 by electroless plating and electrolytic plating and the surface of the copper plating wiring 5 and the surface of the layer insulating film 3 are formed almost flatly. When photosensitive polyimide is applied and top layer insulating films 6 and 8 are formed, the surfaces of the layer insulating films 6 and 8 can be formed flatly and the nonuniformity of the film thickness is reduced. |
申请公布号 |
JPH06132663(A) |
申请公布日期 |
1994.05.13 |
申请号 |
JP19920308250 |
申请日期 |
1992.10.21 |
申请人 |
MURATA MFG CO LTD |
发明人 |
MIYAZAKI MAKOTO;YAMANO KAZUHIKO;IMAGAWA SHUNJIRO |
分类号 |
H05K3/46;(IPC1-7):H05K3/46 |
主分类号 |
H05K3/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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