发明名称 FORMATION METHOD OF PATTERN OF PHOTOREATIVE DIELECTRIC LAYER
摘要 PURPOSE: To provide a patterning method of photo-setting dielectric layer which has a high resolution of a developed pattern, and a photosetting layer is prevented from being damaged during pattern processing and further processings are achieved even under the existence of indoor light. CONSTITUTION: A second layer is formed on a photo-setting first layer including a dielectric solid fraction and an inorganic binder, in the second layer a pattern being formed with an agent for preventing chemical rays from transmitting. The second layer is used as an optical tool to pattern the first layer and remove the second layer, and then a patterned photo-set part is dried, and then calcined to sinter the dielectric solid fraction and the inorganic binder.
申请公布号 JPH0669374(A) 申请公布日期 1994.03.11
申请号 JP19930107076 申请日期 1993.05.07
申请人 E I DU PONT DE NEMOURS & CO 发明人 UIRIAMU JIYON NEBE
分类号 G03F1/00;G03F7/004;H01L23/12;H05K1/03;H05K3/46;(IPC1-7):H01L23/12 主分类号 G03F1/00
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