发明名称 |
Exposure apparatus |
摘要 |
An exposure apparatus includes an exposure beam source for projecting a beam flux for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body of the exposure apparatus; illuminance detectors disposed at least at two points inside the exposure beam flux but outside the exposure zone; and a detecting device for detecting a change in intensity of the exposure beam and a change in relative position of the exposure zone and the exposure beam flux, on the basis of detected illuminances at the two points.
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申请公布号 |
US5285488(A) |
申请公布日期 |
1994.02.08 |
申请号 |
US19920974307 |
申请日期 |
1992.11.10 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
WATANABE, YUTAKA;EBINUMA, RYUICHI;MIZUSAWA, NOBUTOSHI;UZAWA, SHUNICHI;KARIYA, TAKAO |
分类号 |
G03F7/20;(IPC1-7):G21K5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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