发明名称 POSITIVE PHOTORESIST COMPOSITION
摘要 PURPOSE:To obtain the composition superior in various performances, such as resolution, profile, and sensitivity by using phenols containing a specified compound. CONSTITUTION:This composition comprises the alkali-soluble resin obtained by condensing the phenols containing the composed represented by formula with an aldehyde, such as formaldehyde, paraform-aldehyde, or acetaldehyde, in the presence of an acid catalyst and a dissolution-hindering agent, such as a compound having a enzene ring substituted by t-butoxycarbonyloxy group, and an acid generating agent. In the formula each of R1-R9 is, independently, H, optionally substituted straight or branched alkyl or alkenyl, hydroxy, or optionally substituted alkylcarbonyl, and at least one of them is hydroxy and at least 2 H in the o- or p-position to the hydroxy group.
申请公布号 JPH05341531(A) 申请公布日期 1993.12.24
申请号 JP19930005793 申请日期 1993.01.18
申请人 SUMITOMO CHEM CO LTD 发明人 UEDA YUJI;UEKI HIROMI;TAKEYAMA NAOMIKI;KUSUMOTO TAKEHIRO
分类号 G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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