发明名称 Table top parylene deposition chamber
摘要 Disclosed is a table top parylene deposition system wherein reactive monomer vapor enters a deposition chamber tangentially so as to create a rotational flow of vapor within the interior of the chamber. A substrate support fixture is positioned within the chamber and rotated in a direction counter to the rotational flow of vapor.
申请公布号 US5268033(A) 申请公布日期 1993.12.07
申请号 US19910723841 申请日期 1991.07.01
申请人 STEWART, JEFFREY 发明人 STEWART, JEFFREY
分类号 B05D7/24;C23C16/44;C23C16/455;C23C16/458;F16H7/08;(IPC1-7):C23C16/00 主分类号 B05D7/24
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