发明名称 |
Table top parylene deposition chamber |
摘要 |
Disclosed is a table top parylene deposition system wherein reactive monomer vapor enters a deposition chamber tangentially so as to create a rotational flow of vapor within the interior of the chamber. A substrate support fixture is positioned within the chamber and rotated in a direction counter to the rotational flow of vapor.
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申请公布号 |
US5268033(A) |
申请公布日期 |
1993.12.07 |
申请号 |
US19910723841 |
申请日期 |
1991.07.01 |
申请人 |
STEWART, JEFFREY |
发明人 |
STEWART, JEFFREY |
分类号 |
B05D7/24;C23C16/44;C23C16/455;C23C16/458;F16H7/08;(IPC1-7):C23C16/00 |
主分类号 |
B05D7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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