发明名称 PHASE SHIFT MASK AND PATTERN FORMING METHOD
摘要 <p>PURPOSE:To form a pattern making a best use of an advantage of the phase shift technique. CONSTITUTION:In the phase shift mask for forming an island pattern, the phase shift part is arranged so that the light of the same phase is transmitted in one direction of the mask pattern array and the light with an alternately changing phase is transmitted in the other direction of the array, and the light of the same phase is emitted in one direction of the mask array and the light with an alternately changing phase is emitted in the other direction of the array. Thus, even in forming a pattern consisting of array of island pattern, an effective phase shifting technic can be used and be made the most of use.</p>
申请公布号 JPH05313342(A) 申请公布日期 1993.11.26
申请号 JP19910055878 申请日期 1991.02.27
申请人 SONY CORP 发明人 SASAKI MASAYOSHI
分类号 G03F1/30;G03F1/68;H01L21/027;(IPC1-7):G03F1/08 主分类号 G03F1/30
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