| 摘要 |
<p>PURPOSE:To enable the formation of colored layers where org. dyestuff rains uniformly is dispersed in an inorg. matrix by using a vacuum vapor deposition or sputtering method. CONSTITUTION:A photoresist 12 formed on a transparent substrate 11 is pattern- exposed and developed to form photoresist patterns 12P in parts exclusive of the parts where blue colored patterns are to be formed. The blue colored layer 13B consisting of the blue org. dyestuff dispersed in the inorg. matrix is then formed on the transparent substrate 11 and the photoresist patterns 12P by the vacuum vapor deposition method (or sputtering method). The photoresist patterns 12P and the blue colored layer 13B are hen dissolved away to form the patterns of the blue colored layer 13B. Further, the patterns of the green colored layer 13G containing a green org. dyestuff dispersed in the inorg. matrix are formed on the transparent substrate 11 by the similar technique and the patterns of the red colored layer 13R containing a red org. dyestuff dissolved in the inorg. matrix are formed in the prescribed positions.</p> |
