| 摘要 |
PURPOSE:To enhance resolution in patterning by incorporating a cresol novolak resin using hydroxybenzyl alcohol as a copolymer component. CONSTITUTION:This composition contains the cresol novolak resin using as the copolymer component the hydroxybenzyl alcohol, such as 2-hydroxybenzyl alcohol (salicyl alcohol) (melting point 83-85 deg.C), 3-hydroxybenzyl alcohol (melting point 69-72 deg.C), and 4-hydroxybenzyl alcohol (melting point 110-112 deg.C), and moreover various photosensitive materials, such as 4- or 5-naphthoquinonediazido compound. |
