PRODUCTION OF POLYSILANE ORIENTED FILM

摘要

PURPOSE:To produce a polysilane film excellent in the orientation of molecules and nearly free from orientation defects by orienting a polysilane film formed on a substrate by vacuum deposition. CONSTITUTION:The surface of a silicon wafer is rubbed with cotton in one direction to improve the adhesion of a film. Polysilane synthesized by an electrode reaction with phenylmethylsilane as starting material is vacuum-deposited at 100-250 deg.C deposition temp. under 10<-4>-10<-5> Torr pressure to form a thin polysilane film of 300Angstrom thickness. The resulting polysilane oriented film enhances the mobility of carriers and attains reduced bright resistance.