发明名称 MACROMOLECULAR SILICONE, CHEMICALLY AMPLIFIABLE POSITIVE TYPE RESIST MATERIAL AND PATTERN-FORMATION PROCESS
摘要 PROBLEM TO BE SOLVED: To obtain the subject compound that is useful as a base polymer for the subject material of high sensitivity and high resolution by specifying the recurring unit and the weight-average molecular weight. SOLUTION: The recurring units of formula I [Z is a two to hexa-functional 5-12C monocyclic hydrocarbon; R<1> is a 1-8C straight-chain (un)substituted alkyl; R<2> is a group unstable to acid; m is 0 or a positive integer; n is a positive integer where m+n<=5; x is a positive integer; p1 and p2 are each a positive number; q is 0 or a positive number where 0<p1/(p1+p2+q)<=0.9, 0<p2/(p1+p2+q)<=0.9, 0<=q/(p1+p2+q)<=0.7, p1+p2+q=1; 0-90 mol.% of H in the total H of COOH may be crosslinked intra- or intermolecularly with a crosslinking group bearing C-O-C linkage of formula II or formula III (R<3> and R<4> are each H; R<5> is a 1-10C straight chain alkylene; d is 0-10; A is c- functional 1-50C alicyclic saturated hydrocarbon; B is -CO-O-; c is 2-8; c' is 1-7)] are included in this macromolecular compound and its weight-average molecular weight is adjusted to 1,000-50,000.
申请公布号 JPH10324748(A) 申请公布日期 1998.12.08
申请号 JP19980029321 申请日期 1998.01.27
申请人 SHIN ETSU CHEM CO LTD 发明人 KANEKO ICHIRO;NAKAJIMA MUTSUO;ISHIHARA TOSHINOBU;TSUCHIYA JUNJI;HATAKEYAMA JUN;NAGURA SHIGEHIRO
分类号 G03F7/039;C08G77/04;G03F7/075;H01L21/027;(IPC1-7):C08G77/04 主分类号 G03F7/039
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