首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
CLEANING EQUIPMENT FOR SEMICONDUCTOR WAFER
摘要
申请公布号
JPH05166786(A)
申请公布日期
1993.07.02
申请号
JP19910336953
申请日期
1991.12.19
申请人
KAWASAKI STEEL CORP
发明人
MURATA YOSHIHISA
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
您可能感兴趣的专利
RECOVERY OF HEAT ENERGY IN DISTILLATION TOWER
MULTISTAGE WASTE WATER TREATMENT APPARATUS BY DIGESTIVE BACTERIA
SEED SLUDGE RETURN CONTROL APPARATUS OF DIGESTION TANK
ABSORBING MATERIAL AND ITS PRODUCTION
FIXED MEMORY
COPYING MACHINE
SOUND-QUALITY EVALUATING APPARATUS
IMAGE FORMING DEVICE
SUPPORTING MATERIAL OF DIAPHRAGM FOR SPEAKER
LINE STATE DISPLAY SYSTEM
EVAPORATION PROMOTING METHOD AND SLUMP VALUE ADJUSTING METHOD
FORMATION OF ELECTRODE
SEMICONDUCTOR DEVICE
MANUFACTURING CASE FOR RARE-EARTH COBALT PERMANENT MAGNET
ELECTRONIC THERMOMETER
ELECTRONIC THERMOMETER
SOUND-SOURCE PROBING METHOD BY ACOUSTIC HOLOGRAPHY
MATERIAL TESTING APPARATUS
TRACKING ERROR SIGNAL GENERATING DEVICE
CATALYTIC BURNING APPARATUS
