SURFACE TREATMENT METHOD OF SEMICONDUCTOR SUBSTRATE,申请号JP19910327211-传众专利搜索

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发明名称	SURFACE TREATMENT METHOD OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH05160061(A)	申请公布日期	1993.06.25
申请号	JP19910327211	申请日期	1991.12.11
申请人	FUJITSU LTD	发明人	AOYAMA ATSUYUKI
分类号	H01L21/268;H01L21/302;H01L21/304	主分类号	H01L21/268
代理机构		代理人
主权项
地址

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