发明名称 METHOD AND APPARATUS FOR CONTROLLED SPRAY ETCHING
摘要 2123115 9309563 PCTABS00022 A method and apparatus (10) is provided for controlled spray etching, in which panels, such as printed circuit boards (P) are delivered through an etching chamber (10), to have a spray etchant sprayed generally on upper and lower surfaces of the panel (P). The spray is controlled such that a reduced amount of etchant is provided on the perimeter surface (51, 52) portions of the panel, relative to the central surface (71) portions of the panel (P), transversely of the path of travel of the panels (P) through the etching chamber (10). The spray may be varied in amount, preferably by varying the pressure at different locations transversely of the chamber; the spray longitudinally through the chamber, may vary, to spray leading (51) and trailing surface (52) portions of the panels (P) a lesser amount than central portions (71) of the panels (P), measured longitudinally. The control of the spray of leading (51) and trailing surface (52) portions of the panel (P) may be facilitated by one or more sensors (50, 50') that control an intermittent discharge of spray etchant near the inlet (15) to the etch chamber (10).
申请公布号 CA2123115(A1) 申请公布日期 1993.05.13
申请号 CA19922123115 申请日期 1992.10.30
申请人 ATOTECH USA INC 发明人 KETELHOHN KARL F G;BALL DONALD F
分类号 C23F1/08;H01L21/00;H05K3/06;(IPC1-7):H05K3/06 主分类号 C23F1/08
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