| 摘要 |
<p>X-rays enter an airtight chamber (4) through a beam duct (15), pass through a transmission window (5), and expose a wafer (1) and mask (3) disposed outside the airtight chamber. The wafer and mask are held by a wafer chuck (2a) and a mask holder (6), respectively. The mask holder includes a pressure sensor (7), which detects variations in the atmospheric pressure. An output from the pressure sensor is converted into a change in the intensity of the x-rays by an arithmetic unit (17), and is transmitted to a control unit (19), which controls a driving unit (18) of a shutter (8). By thus controlling the moving speed of the shutter in accordance with variations in the atmospheric pressure, it is possible to prevent variations in the amount of x-ray exposure of the wafer. <IMAGE></p> |
