摘要 |
<p>A small-sized fast atom beam source which is capable of neutralizing ions at a high rate and of emitting a fast atom beam efficiently and with excellent directivity, wherein, a gas is introduced into the area between a plate-shaped cathode having multiplicity of atom emitting holes and a plate-shaped anode disposed to face opposite to the cathode to induce gas discharge by a DC high-voltage power supply, thereby forming a plasma, and ions that are produced by the plasma are accelerated toward the cathode and neutralized in and near the atom emitting holes, which have length larger than the diameter therof, thereby emitting a fast atom beam at a high rate of neutralizaion.</p> |