| 摘要 |
PURPOSE:To form a reflection preventive film capable of arbitrarily changing the properties thereof easily and evenly on an underneath substrate, which is necessary in exposure of the pattern formation step. CONSTITUTION:An underneath substrate 1 having a stepped high reflective film 2 is coated with a resist 6 containing a light absorbing agent 7. Next, the whole body is baked at 80 deg.C-120 deg.C to concentrate the light absorbing agent 7 in the interface between the high reflective film 2 and the resist 6 so as to use the light absorbing agent 7 as a reflection preventive film in the resist exposure step. Furthermore, the reflection preventive film having specific properties can be formed by selecting the kinds of the extinction agent 7. |
