发明名称 BIPOLAR TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 A bipolar transistor in which a buried collector region, a base region and an emitter region are formed in a device forming region surrounded by an isolation region and in which a base contact electrode and a collector contact electrode are arranged in symmetry with each other, and a process for preparing the transistor. The collector contact electrode is formed through an opening formed in a portion of the isolation region for connection with the buried collector region. In this manner, the collision between the base region and the collector contact region may be avoided effectively.
申请公布号 CA1309191(C) 申请公布日期 1992.10.20
申请号 CA19880573242 申请日期 1988.07.28
申请人 SONY CORPORATION 发明人 MIWA, HIROYUKI
分类号 H01L29/73;H01L21/331;H01L29/417;H01L29/423;H01L29/732 主分类号 H01L29/73
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