| 摘要 |
PURPOSE:To obtain a radiation-sensitive compsn. having superior heat resistance and high resolution and to form a pattern with the compsn. CONSTITUTION:This radiation-sensitive compsn. contains a film forming component and a radiation-sensitive material. The film forming component is a mixture of 30-70 pts.wt. poly(o-hydroxystyrene) having >=10,000 wt. average mol.wt. with 70-30 pts.wt. poly(phydroxystyrene) having <10,000 wt. average mol.wt. The radiation-sensitive material induces a reaction varying the solubility of a coating film to an aq. alkali soln. when irradiated with active radiation. This radiation-sensitive compsn. is developed with an aq. alkali soln., has superior heat resistance and enables the formation of a pattern having high resolution and hardly reducing the film thickness. |
