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发明名称
PLASMA ETCHING METHOD OF III-V COMPOUND SEMICONDUCTOR
摘要
申请公布号
JPH04279029(A)
申请公布日期
1992.10.05
申请号
JP19910000646
申请日期
1991.01.08
申请人
NEC CORP
发明人
FUJIEDA SHINJI
分类号
H01L21/302;H01L21/3065
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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