| 发明名称 |
DEVELOPER FOR PHOTOSENSITIVE RESIN |
| 摘要 |
PURPOSE:To control the solubility of an unexposed part to a developer and to form a high-contrast resin pattern. CONSTITUTION:This developer for a photosensitive resin is an alkaline aq. soln. contg. a compd. of calcium, strontium and/or barium by 1-1,000ppm (expressed in terms of the metals). |
| 申请公布号 |
JPH04258958(A) |
申请公布日期 |
1992.09.14 |
| 申请号 |
JP19910104053 |
申请日期 |
1991.02.13 |
| 申请人 |
SUMITOMO BAKELITE CO LTD |
发明人 |
TAKEUCHI ETSU;TAKEDA TOSHIRO;BANBA TOSHIO |
| 分类号 |
G03F7/32;H01L21/027;H01L21/30 |
主分类号 |
G03F7/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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