发明名称 PHOTOMASK TESTER
摘要 <p>PURPOSE:To measure an accurate phase variation by a phase member in a phase shift photomask easily and speedily. CONSTITUTION:This tester is provided with an irradiation optical system (consisting of those of illuminant 1, an ellipsoidal mirror, mirror 3, lens 4, aperture diaphragm 5, lens 7, variable aperture diaphragm 11) irradiating a tested pattern of a photomask 8 with a monochromatic light of specified wavelength, and a photoelectric converter 10 detecting a Fourier transform image FP of the tested pattern, and on the basis of a spatial frequency coordinate position at a minimum point of the Fourier transform image FP, a phase variation is calculated by an operational means 13.</p>
申请公布号 JPH04229863(A) 申请公布日期 1992.08.19
申请号 JP19900415191 申请日期 1990.12.27
申请人 NIKON CORP 发明人 UMAGOME NOBUTAKA;SHIRAISHI NAOMASA
分类号 G01B11/24;G01J9/00;G01N21/88;G01N21/956;G03F1/84;H01L21/027 主分类号 G01B11/24
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