| 摘要 |
PURPOSE:To prevent the deterioration of a recording layer by using a tantalum oxide film contg. a small amt. of a specified metal oxide. CONSTITUTION:At least one of the groups III and IV metals of the periodic table such as Al, Si, Ti, Sn, Zr and Hf is added to or incorporated into a metallic Ta target by 0.1-10 atomic % and the resulting target is used or a chip of a group III or IV metal is arranged on a metallic Ta target at the time of sputtering so as to alloy a formed thin film. Superior aging stability is ensured and deterioration at high temp. and humidity can be prevented. |
