| 摘要 |
Polymers suitable for use as positive photoresists can be prepared, in the absence or presence of other olefinically unsaturated monomers, from benzoates comprising an olefinic unsaturated substituent and consisting of formula I <IMAGE> (I) wherein R1 and R2 are each independently of the other a hydrogen atom, C1-C4alkyl or phenyl, R3 is a hydrogen atom, methyl or a halogen atom, R4 is a hydrogen atom or methyl, R5 is C1-C4alkyl or C6-C12aryl, and R6 and R7 are each independently of the other a hydrogen atom, C1-C4alkyl or C6-C12aryl, and R5 and R7, when taken together, may also be an unsubstituted or a C1-C4alkyl-, C1-C4alkoxy-, C6-C12aryl- or C6-C12aryloxy-substituted ethylene, propylene or butylene radical.
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