| 摘要 |
PURPOSE:To make it possible to utilize a photomask in a fine processing method using laser abrasion phenomenon, by using a polymer having photosensitive molecules as side chain or a polymer doped with photosensitive molecules as a resist. CONSTITUTION:Some photosensitive molecules are transformed, by light, into molecules having an electron absorbing band in a wavelength region being different from original molecules; for instance, a polymer having a photochromic molecule as side chain or a polymer doped with photosensitive molecules is used as a resist; a stationary light source such as a xenon lamp or a mercury lamp and a photomask is used for exposure; and a pattern is printed by changes made by light from the photosensitive molecules. Then, laser light absorbed to a printed portion is collected and projected thereby creating laser abrasion and forming a pattern. In this way, the laser abrasion fine processing method permitting the use of mask is provided. |
