发明名称 Method for conditioning halogenated polymeric materials and structures fabricated therewith.
摘要 <p>A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided. <IMAGE></p>
申请公布号 EP0477543(A2) 申请公布日期 1992.04.01
申请号 EP19910114287 申请日期 1991.08.26
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BICKFORD, HARRY R.;DUKE, PETER J.;FOSTER, ELIZABETH;GOLDBERG, MARTIN J.;MARKOVICH, VOYA R.;MATTHEW, LINDA C.;MCBRIDE, DONALD G.;O'TOOLE, TERRENCE R.;TISDALE, STEPHEN L.;VIEHBECK, ALFRED
分类号 C08J3/24;C23C18/20;C23C18/28;C25D5/56;H05K1/03;H05K3/18;H05K3/38;H05K3/42 主分类号 C08J3/24
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