METHOD OF MAKING SEMICONDUCTOR INTEGRATED CIRCUIT, PATTERN DETECTING METHOD, AND SYSTEM FOR SEMICONDUCTOR ALIGNMENT AND REDUCED STEPPING EXPOSURE FOR USE IN SAME

摘要

According to the present invention, in making alignment between a semiconductor integrated circuit wafer and a mask or a reticle in light exposure of the wafer with a monochromatic light such as g-, i- or h- line of a mercury lamp, using a reduced stepping exposure system, light from a predetermined pattern on the wafer is taken out to an off-axis position and observed according to a through-the-lens method; in this case as a characteristic feature of the invention, the observation light is taken out from below the reticle and is passed through chromatic aberration correcting lenses, thereby permitting the use of a polychromatic or continuous spectrum light.