Device for treatment of wafer-shaped articles, especially silicon wafers

摘要

PCT No. PCT/AT96/00034 Sec. 371 Date Dec. 11, 1996 Sec. 102(e) Date Dec. 11, 1996 PCT Filed Feb. 28, 1996 PCT Pub. No. WO96/35227 PCT Pub. Date Nov. 7, 1996In chamber (1) a basket which is formed by ring (3) and retaining fingers (4) is pivotally mounted. By turning the basket, wafer-shaped article (7) which is held by retaining fingers (4) at an axial distance from ring (3) is caused to rotate. Nozzle (10 and 11) from which a treatment fluid can be applied to article (7) is assigned both to upper and lower large surface (9) of article (7).