发明名称 Protective coating useful as a passivation layer for semiconductor devices
摘要 A protective coating useful as a passivation layer for semiconductor devices incorporates a thin film of an amorphous diamond-like carbon. In one implementation, a thin film of amorphous silicon is deposited over the carbon material. The semiconductive passivation coating prevents electrical shorts, dissipates charge build-up and protects against chemical contamination.
申请公布号 US5087959(A) 申请公布日期 1992.02.11
申请号 US19880162912 申请日期 1988.03.02
申请人 MICROWAVE TECHNOLOGY, INC. 发明人 OMORI, MASAHIRO;STONEHAM, EDWARD B.
分类号 H01L23/29;H01L23/31 主分类号 H01L23/29
代理机构 代理人
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