发明名称 Chemical vapor deposition method of high quality diamond.
摘要 <p>Diamond having a large coefficient of thermal conductivity is prepared by a CVD method in which a reaction gas is decomposed and reacted under such condition that a concentration of carbon atoms in relation to hydrogen gas (A %), a concentration of nitrogen gas in relation to the whole reaction gas (B ppm) and a concentration of oxygen atoms in relation to the hydrogen gas (C %) satisfy the equation: &lt;MATH&gt; provided that alpha is not larger than 13, or B is not larger than 20.</p>
申请公布号 EP0469626(A2) 申请公布日期 1992.02.05
申请号 EP19910113034 申请日期 1991.08.02
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 FUJIMORI, NAOJI;IKEGAYA, AKIHIKO;IMAI, TAKAHIRO;OTA, NOBUHIRO;SHIBATA, TAKAYUKI
分类号 C23C16/27 主分类号 C23C16/27
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