MASK FOR PHOTOLIGHTGRAPHY AND PRODUCTION THEREOF

摘要

PURPOSE:To control the film thickness of transparent films used as the phase shifters of a phase shift mask with high accuracy by providing the transparent film as a monitor film on a metallic thin film for light shielding. CONSTITUTION:The metallic thin films 4a for light shielding are patterned on a transparent glass substrate 2 and th transparent films 12a for inverting the phase of the exposing light transmitted therethrough are formed as the phase shifters in the phase shifter parts 8. A monitor part 10 is provided and the same transparent film 12b as the transparent films 12a of the phase shifter parts 8 is formed as the monitor film on the metallic thin film 4b for light shielding of this monitor part 10. The control of the film thickness of the transparent films 12a of the phase shifter parts 8 by using the transparent film 12b for monitor is possible in this way.