Process for galvanic treatment with pulsed currents.

摘要

According to the invention the galvanic treatment by a deposition of nickel, by itself or mixed, is carried out using pulsed currents in which the time of application of the cathode current (Tc) is between 0.1 and 10 ms, and this makes it possible to limit the blocking of components incorporating small-sized hollows (100 to 400 m) in particular in the case of production of a rotary printing stencil. The pulsed current is either a simple current or preferably an inverted current with a rate of application of the anode current (Ta) of between 0.5 and 10 ms and a rest time shorter than 10 ms. <IMAGE>