发明名称 |
Method of manufacturing zinc chalcogenide semiconductor devices using LP-MOCVD |
摘要 |
A method of growing zinc chalcogenide in an atmosphere which contains the vapor of di- pi -cyclopentadienyl manganese or di- pi -alkyl cyclopentadienyl manganese that serves as a source of manganese. By growing zinc chalcogenide in the above atmosphere, there is obtained a manganese-doped zinc chalcogenide having a very high crystal quality, which is very suitable for the active layer in light emitting devices.
|
申请公布号 |
US5026661(A) |
申请公布日期 |
1991.06.25 |
申请号 |
US19890423552 |
申请日期 |
1989.10.13 |
申请人 |
HITACHI, LTD. |
发明人 |
MIGITA, MASAHITO;KANEHISA, OSAMU;SHIIKI, MASATOSHI;YAMAMOTO, HAJIME |
分类号 |
C09K11/57;C09K11/88;C23C16/30;H01L21/365;H01L33/00;H05B33/10;H05B33/14;H05B33/26 |
主分类号 |
C09K11/57 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|