发明名称 Method of manufacturing zinc chalcogenide semiconductor devices using LP-MOCVD
摘要 A method of growing zinc chalcogenide in an atmosphere which contains the vapor of di- pi -cyclopentadienyl manganese or di- pi -alkyl cyclopentadienyl manganese that serves as a source of manganese. By growing zinc chalcogenide in the above atmosphere, there is obtained a manganese-doped zinc chalcogenide having a very high crystal quality, which is very suitable for the active layer in light emitting devices.
申请公布号 US5026661(A) 申请公布日期 1991.06.25
申请号 US19890423552 申请日期 1989.10.13
申请人 HITACHI, LTD. 发明人 MIGITA, MASAHITO;KANEHISA, OSAMU;SHIIKI, MASATOSHI;YAMAMOTO, HAJIME
分类号 C09K11/57;C09K11/88;C23C16/30;H01L21/365;H01L33/00;H05B33/10;H05B33/14;H05B33/26 主分类号 C09K11/57
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